Technology of Production of Tungsten-Based Cold-Emission Cathodes with a Thin Surface Epoxide Layer

Authors

  • A. Knápek Department of Physics, Faculty of Electrical Engineering and Communication, University of Technology, Brno
  • L. Grmela Department of Physics, Faculty of Electrical Engineering and Communication, University of Technology, Brno

Keywords:

cold-emission cathodes, electrochemical etching

Abstract

The article describes the title technology. Requirements for electron sources for the cathode tip and emission plane are specified. The implemented technology uses a fully automated etching setup. Finally, the main algorithm of driver software is described. The main advantages of electrochemically-made cold emission cathodes are given.

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Published

2013-07-15

How to Cite

Knápek, A., & Grmela, L. (2013). Technology of Production of Tungsten-Based Cold-Emission Cathodes with a Thin Surface Epoxide Layer. Chemické Listy, 107(7), 545–549. Retrieved from http://ww.w.chemicke-listy.cz/ojs3/index.php/chemicke-listy/article/view/648

Issue

Vol. 107 No. 7 (2013)

Section

Articles